Coverage threshold for laser-induced lithography
نویسندگان
چکیده
منابع مشابه
Optimal lithium targets for laser-plasma lithography
Lithium containing droplet and cluster targets irradiated by laser pulses are proposed as prospective source of for soft x-ray lithography. Analytical model and simulations show that laser with repetition rate of several MHz with energy of several mJ and pulse duration 10 ps is required.
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ژورنال
عنوان ژورنال: Applied Physics A
سال: 2017
ISSN: 0947-8396,1432-0630
DOI: 10.1007/s00339-017-0968-4